 ELIPSOMETRIA The SpecEl-2000 spectroscopic ellipsometer works in the visible spectral range and is one of the most compact, easy-to-use and cost-efficient systems to measure not only multiple layer stacks but also optical properties such as refractive index and absorption. Compared to reflectometry, spectroscopic ellipsometry has the big advantage of measuring just relative changes in the phase and amplitude of the light instead of absolute intensity. In this way ellipsometry is independent from any reference measurement and multiple parameters can be determined simultaneously. Dostępne modele: SPECEL2000-VIS SPECEL2000-UV/VIS/NIR
REFLEKTOMETRIA The fiber optical reflectometer NanoCalc-2000 operates in the UV/VIS/NIR spectral range and measures up to three layer thicknesses of transparent and semi-transparent layers from 10nm up to several hundred microns. The flexible fiber-optics sensor head allows almost any adaptation. W ofercie: NANOCALC2000 NANOCALC2000-MIK
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- fast, reliable and easy measurement of transparent and semi-transparent thin layers.
- layer thickness from a few nanometers up to several hundreds of microns.
- The large spectral range available from 250nm (UV) to 1100nm (NIR)
- Short measurement time
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ideal tool for fast, reliable and easy measurement of transparent and semi-transparent thin layers. measure layers of just a few nanometers up to several hundreds of microns. large spectral range available from 250nm (UV) to 1100nm (NIR) short measurement time flexible positioning of the fiber head
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thin film measurement on flat samples like wafers or glass plates, if precise measurements of layers thickness or refractive index, absorption or components ratio is needed. transparent & semi-transparent film. measurement of the thickness of thin films in a range of 1nm up to about 5µm.
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SPECEL-2000-UV/VIS/NIR jest najnowszym produktem firmy Mikropack. To kompaktowe i łatwe w użyciu urządzenie umożliwia bezpośredni pomiar dla grubości przezroczystych lub półprzezroczystych cienkich warstw na płaskich powierzchniach, wyznaczanie charakterystyk elipsometrycznych „psi” i „delta” i optycznych właściwości badanych materiałów np.: n i k. |
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